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  • The threshold voltage VT of the MOS field effect tube (VDS=0)

    The so-called ideal MOS tube assumes that there is no positive charge in the gate oxide layer, and electrons cannot be exchanged between the metal gate and the semiconductor (that is, the contact pote

    2020.12.10

    The threshold voltage VT of the MOS field effect tube (VDS=0)

    The so-called ideal MOS tube assumes that there is no positive charge in the gate oxide layer, and electrons cannot be exchanged between the metal gate and the semiconductor (that is, the contact pote

    2020.12.10

  • Characteristic Analysis of the Threshold Voltage of MOS Field Effect Transistor

    The threshold voltage of the MOS field effect tube is the turn-on voltage VT for the enhanced tube, and the pinch-off voltage VT for the depletion tube, which is also denoted by VT for convenience.

    2020.12.9

    Characteristic Analysis of the Threshold Voltage of MOS Field Effect Transistor

    The threshold voltage of the MOS field effect tube is the turn-on voltage VT for the enhanced tube, and the pinch-off voltage VT for the depletion tube, which is also denoted by VT for convenience.

    2020.12.9

  • Detailed explanation of the characteristic curve and three working areas of MOS field effect tube

    The characteristic curve of MOS field effect tube is discussed with n-channel enhancement mode MOS tube as an example. MOS field effect tube has a variety of connection methods in applications, the mo

    2020.12.9

    Detailed explanation of the characteristic curve and three working areas of MOS field effect tube

    The characteristic curve of MOS field effect tube is discussed with n-channel enhancement mode MOS tube as an example. MOS field effect tube has a variety of connection methods in applications, the mo

    2020.12.9

  • Analysis of the types and characteristics of MOS field effect transistors

    The type of MOS field effect tube. This tube uses n-type semiconductor as the substrate material, and the source and drain regions are p+ diffusion regions. In Figure 1.1-3, replace n+ with p+, and p-

    2020.12.8

    Analysis of the types and characteristics of MOS field effect transistors

    The type of MOS field effect tube. This tube uses n-type semiconductor as the substrate material, and the source and drain regions are p+ diffusion regions. In Figure 1.1-3, replace n+ with p+, and p-

    2020.12.8

  • The working principle and basic structure of MOS field effect tube

    The working principle of the MOS field effect tube, the typical structure of the MOS field effect tube made by the planar process is shown in Figure 1.1-2, where the substrate material is a p-type sem

    2020.12.8

    The working principle and basic structure of MOS field effect tube

    The working principle of the MOS field effect tube, the typical structure of the MOS field effect tube made by the planar process is shown in Figure 1.1-2, where the substrate material is a p-type sem

    2020.12.8

  • Detailed explanation and characteristics of the basic principles of MOS field effect transistors

    The basic principles of MOS field effect transistors. Generally, quality transistors can be divided into two categories. One is called "bipolar" transistors. When this type of transistor works, electr

    2020.12.8

    Detailed explanation and characteristics of the basic principles of MOS field effect transistors

    The basic principles of MOS field effect transistors. Generally, quality transistors can be divided into two categories. One is called "bipolar" transistors. When this type of transistor works, electr

    2020.12.8

  • Analysis of the basic process steps of the main process of VMOS

    (1) A silicon dioxide mask is grown on the N- epitaxial layer with (100) plane N+-Si as the substrate by one-time oxidation. As shown in Figure 6-26(a). (2) Photolithography, boron diffusion and boron

    2020.12.7

    Analysis of the basic process steps of the main process of VMOS

    (1) A silicon dioxide mask is grown on the N- epitaxial layer with (100) plane N+-Si as the substrate by one-time oxidation. As shown in Figure 6-26(a). (2) Photolithography, boron diffusion and boron

    2020.12.7

  • Detailed explanation and analysis of VMOS process structure and characteristics

    Detailed explanation and analysis of VMOS process structure and characteristics. With the increasing development of MOS large-scale integrated circuits and very large-scale integrated circuits, how to

    2020.12.7

    Detailed explanation and analysis of VMOS process structure and characteristics

    Detailed explanation and analysis of VMOS process structure and characteristics. With the increasing development of MOS large-scale integrated circuits and very large-scale integrated circuits, how to

    2020.12.7

  • Analysis of E/DMOS Structure Made by Double Diffusion Method

    Double-diffusion method for manufacturing E/DMOS double-diffusion method, referred to as DMOS process. The substrate uses P-silicon wafers (called χ substrates). Such a low-concentration P-type substr

    2020.12.4

    Analysis of E/DMOS Structure Made by Double Diffusion Method

    Double-diffusion method for manufacturing E/DMOS double-diffusion method, referred to as DMOS process. The substrate uses P-silicon wafers (called χ substrates). Such a low-concentration P-type substr

    2020.12.4

  • Overview of SiO2-AI2O3 Double-Gate E/DMOS Circuit

    SiO2-AI2O3 double-gate E/DMOS, because the AI2O3 layer contains negative charges, it can offset the positive charges in SiO2, so the thickness ratio of SiO2 and AI2O3 can be controlled, so that the th

    2020.12.4

    Overview of SiO2-AI2O3 Double-Gate E/DMOS Circuit

    SiO2-AI2O3 double-gate E/DMOS, because the AI2O3 layer contains negative charges, it can offset the positive charges in SiO2, so the thickness ratio of SiO2 and AI2O3 can be controlled, so that the th

    2020.12.4

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Products
Field effect tube
Low current MOS tube
Super Junction Field Effect Transistor
Three-terminal regulator tube
Fast recovery diode
Silicon Carbide Field Effect Transistor
Silicon carbide diode
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Adapter
Inverter
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Products
Field effect tube Low current MOS tube Super Junction Field Effect Transistor Three-terminal regulator tube Fast recovery diode Silicon Carbide Field Effect Transistor Silicon carbide diode
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Company Dynamics Industry Information
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