Figure 3.20 is a NOR gate circuit composed of P-channel transistors. This circuit adopts the form of leaking ground and is equipped with output buffer. Circuits in large-scale integrated circuits are also commonly combined with such gate circuits.
The N-channel 144-bit memory is developed as a high-speed MOS memory 18), and the unit circuit used in this memory is shown in Figure 3.21. It is a simple circuit composed of a flip-flop and a write-read gate. In order to achieve a high-speed write time of 40 nanoseconds, we use an N-channel with high mobility. Since the MOS tube made by the usual process is depletion type, current flows when the gate bias is zero, but after the substrate is reverse biased, it becomes an enhanced type with a positive threshold voltage, and the components are isolated from each other of.
Figure 3.22 shows a part of the shift register circuit. T1 and T4 are used as transmission gates, just add clocks to eachtime,The state of the previous stage is transferred. The clock signals added to the T1 address line and T4 are inverse to each other, and the clock signal is actually generated by a single-phase pulse through two inverters. The gate capacitance of T2 and T5 is used for temporary storage. The maximum integration level is 200-bit monolithic integration, and there are also reports of large-scale integrated circuits integrating 2,000 bits on the substrate 19).
Contact: Mr. Zou
Contact number: 0755-83888366-8022
Mobile phone: 18123972950
QQ: 2880195519
Contact Address: 5C1, Block CD, Tianji Building, Tianan Digital City, Chegongmiao, Futian District, Shenzhen
Please search WeChat official account: "KIA Semiconductor" or scan the following picture to "Follow" official WeChat official account
Please "follow" the official WeChat account: provide MOS tube technical assistance