MOS FET model shown in Figure 1.4-6.
The main parameter relations and process parameters of MOS FET are as follows (see reference [12] for details);
where a is the short channel correction coefficient,
where μ is in the formula. It is the low electric field carrier mobility.
θ is the correction factor for mobility.
where L is the design value of the channel length, is the diffusion depth (junction depth), and the short-channel MOS threshold voltage model a is the lateral correction coefficient of the diffusion.
where
Where W is the design value of the channel width, and xw is the thickness of the field oxide layer
Use the formula (1.4-21) for VD in the formula (1.4-26)Instead, short-channel MOS threshold voltage model. The IDS relational expression of the saturation zone can be obtained.
where
W and L are the width and length of the drain or source diffusion area, respectively,Is the contact potential of the p-n junction.
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